Optimised implant technique
May reduce procedure time due to elimination of the superior parasternal incision
“Pairwise comparison of implantation techniques demonstrated that the 2-incision technique with the pulse generator in the subcutaneous position was significantly shorter in procedure duration than the other 3 implant techniques”1
Improves Cosmetic Outcome for Patients
- Elimination of scar improving cosmetic outcome
- Removing superior incision as a site of potential discomfort2
Device Positioning and Patient Prep
Two Incision Implant Technique with Electrode Delivery System
(Please see EMBLEM/EMBLEM MRI Manual for full implant instructions)
Before implant, record a 3-lead surface ECG to assess the appropriateness of surface signals that correlate with device detection.

Electrode Delivery System (EDS) 4712
EDS is designed for use with the 2-incision technique*, to provide consistency and efficiency at implant.3

EDS consists of 2 Tunnelling Tools with pre-loaded sheaths:
- Pre-loaded sheaths are appropriately sized for Tunnelling Tool length
- Diameter of rod, and tapering at end of sheath is designed to prevent sheath kinking
- Dedicated Superior Tunnelling Tool for 2-incision technique (pre-loaded 14 cm sheath)
- Standard length Lateral Tunnelling Tool for sheath delivery of electrode (pre-loaded 21 cm sheath)
Intermuscular Technique
Benefits of intermuscular device positioning highlighted in literature4-8:
- Optimal position for DFT and impedance measurements (dorsal/posterior, under adipose tissue)
- Reduced risk of pocket complications (erosion and infection)
- Reduced device migration
- Patient comfort: device is protected by muscle layer
- Cosmetic outcomes: can is less visible
Optimal S-ICD Placement
Post-implant X-rays show optimal placement of the pulse generator and subcutaneous electrode.
Note: This image shows the placement of the first generation S-ICD system in a patient. Device location recommendations do not change from the S-ICD System to the EMBLEM MRI S-ICD.

Excellent Cosmetic Outcome
